JBM-4700F

JBM-4700F is a dual beam microscope combining scanning electron imaging with focused gallium ion beam milling capabilities. The microscope is used to produce thin lamellas, which can be analysed in TEM, from a bulk sample or to obtain volumetric information about the specimen via serial face milling. SEM can achieve the resolution of 1.6nm at 1kV.

JBM-4700F is shared between Research Complex at Harwell, electron Physical Science Imaging Centre (ePSIC) and the Rosalind Franklin Institute.

Our JBM-4700F features:

  • Schottky field emission gun
  • Secondary electron (SE) and back-scattered electron (BSE) detectors
  • Ga ion beam
  • Gas injection system for deposition of tungsten or platinum
  • Various sample holders (including vacuum transfer)
  • In situ and ex situ lift out systems

 

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